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Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta

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Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta

Brand Name : ROYAL

Model Number : RT1000-Ta

Certification : CE

Place of Origin : Made in China

MOQ : 1 set

Price : negotiable

Payment Terms : L/C,T/T

Supply Ability : 5 sets per month

Delivery Time : 8 to 12 weeks

Packaging Details : Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.

Name : Tantalum PVD Sputtering Deposition Machine

Coatings : Tantalum, Gold, Silver etc.

Technology : Pulsed DC sputtering

Application : Microelectronics industry,Medical instruments ,Coatings on corrosion resistant parts,,

Ta film properties : Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.

Factory Location : Shanghai city, China

Worldwide Service : Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America

Training Service : Machine operation, maintenance, coating process Recipes, program

Warranty : Limited warranty 1 year for free, whole life for machine

OEM & ODM : available, we support tailor made design and fabrication

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Magnetron Sputtering is widely used to deposit refractory metals like tantalum, titanium, tungsten, niobium, which would require very high temperatures of deposition, and precious metals: Gold and Silver and which is also used for deposition of lower melting points metals like copper, aluminum, nickle, chrome etc.

Tantalum is most used in the electronic industry as a protective coating because of its good resistance to erosion.

Applications of Sputtered Tantalum thin film:
1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

  1. Medical instruments like body implants for its highly biocompatability property;
  2. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;
  3. Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defected and is adherent to the substrate is intended to protect.

Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-TaTantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta


Technical Advantages

  1. A standardized trolley is applied which allows easy and safe loading/unloading of the substrate holders and work pieces in/out of the deposition chamber
  2. The system is safety interlocked to prevent incorrect operation or unsafe practices
  3. The substrate heaters are provided which mounted in the center of chamber, PID controlled thermocouple for high accuracy, to enhance the condense film’s adhesion
  4. Strong vacuum pumps configurations with Magnetically suspension molecular pump via gate valve connected to chamber; backed with Leybold’s roots pump and two stage rotary vane pump, mechanical pump.
  5. High energy ionized plasma source is applied with this system to guarantee the uniformity and density.


    Tantalum(Ta) Magnetron Sputtering Deposition System-RT1000-TaTantalum(Ta) Magnetron Sputtering Deposition System-RT1000-Ta


Royal Technology’s standardized Tantalum sputtering deposition system:

Main Configurations
MODEL RT1000-Ta
TECHNOLOGY

Pulsed DC magnetron sputtering

Cathodic arc plating (for option, determined by coating process)
CHAMBER MATERIAL Stainless Steel (S304)
CHAMBER SIZE Φ1000*1000mm (H)
CHAMBER TYPE D shape, cylindrical chamber
ROTATION RACK & JIG SYSTEM Satellite driving or central driving system
POWER SUPPLIES

DC Sputtering Power Supply: 2~4 sets
Bias Power supply: 1 set

Ion Source: 1 set
DEPOSITION MATERIAL Ta, Ti/Cr/TiAl, Au, Ag, Cu etc.
DEPOSITION SOURCE Planar Sputtering Cathodes + circular arc cathodes
CONTROL PLC(Programmable Logic Controller) + IPC
( manual+ auto+ semi-auto operation models)
PUMP SYSTEM Rotary Vane Pump: SV300B – 1 set (Leybold)
Roots Pump: WAU1001 – 1 set (Leybold)
Holding Pump: D60C – 1 set (Leybold)
Magnetic Suspension Molecular Pump:
MAG2200 – 2 sest (Leybold)
GAS MASS FLOW CONTROLLER 2 channels: Ar and N2
VACUUM GAUGE Inficon or Leybold
SAFETY SYSTEM Numerous safety interlocks to protect operators and equipmen
HEATING Heaters: 20KW. Max. temp.: 450℃
COOLING Industrial Chiller (Cold Water)
POWER MAX. 100KW (Approx.)
AVERAGE POWER CONSUMPTION 45 KW (Approx.)
GROSS WEIGHT T (Approx.)
FOOT PRINT ( L*W*H) 4000*4000 *3600 MM
ELECTRICAL POWER

AC 380V/3 phases/50HZ / 5 line


Insite:

Built Time: 2018

Location: China

Please contact us for more applications and specifications.


Product Tags:

vacuum coating plant

      

high vacuum coating machine

      
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